A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment

نویسندگان

  • Jian-Shian Lin
  • Chieh-Lung Lai
  • Ya-Chun Tu
  • Cheng-Hua Wu
  • Yoshimi Takeuchi
چکیده

Nanoimprint lithography (NIL) has overcome the limitation of light diffraction. It is capable of printing features less than 10nm in size with high lithographic resolution, high manufacturing speed, and low production cost. The uniformity of pressure, however, remains a critical issue. To improve the uniformity of pressure, we developed a flexible uniform pressure component based on Pascal’s Law. When external force is applied to this component, uniform pressure is delivered to the mold and substrate. Average pressure over the embossed area using our improved nanoimprint equipment deviates by only 3.15%.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Micro/nanopatterning of proteins via contact printing using high aspect ratio PMMA stamps and nanoimprint apparatus.

Micro- and nanoscale protein patterns have been produced via a new contact printing method using a nanoimprint lithography apparatus. The main novelty of the technique is the use of poly(methyl methacrylate) (PMMA) instead of the commonly used poly(dimethylsiloxane) (PDMS) stamps. This avoids printing problems due to roof collapse, which limits the usable aspect ratio in microcontact printing t...

متن کامل

Three-Dimensional Patterning using Ultraviolet Nanoimprint Lithography

Although an extensive number of publications have been reported on nanoimprint lithography (NIL) techniques, the ability of NIL for three-dimensional (3-D) patterning has not been fully addressed in terms of the mold fabrication and imprint processes. Developing technologies for patterning 3-D and multilevel features are important because they eliminate multiple steps and complex interlevel ali...

متن کامل

Towards nanoimprint lithography-aware layout design checking

Just as the simulation of photolithography has enabled resolution-enhancement through Optical Proximity Correction, the physical simulation of nanoimprint lithography is needed to guide the design of products that will use this process. We present an extremely fast method for simulating thermal nanoimprint lithography. The technique encapsulates the resist’s mechanical behavior using an analyti...

متن کامل

Penetration of Residual Layer in Nanoimprint Lithography by Direct Oxidation of Photocatalytic Film

INTRODUCTION The demand for the practical use of the nanoimprint lithography (NIL) has risen for the miniaturization in two-dimensional micro/nano fabrication technology. Photolithography is now used widely, however, has a few of difficulties such as the high equipment cost and the diffraction limit. NIL, in which a resist on a substrate is patterned by mechanical pressing a nanostructured mold...

متن کامل

Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds

Articles you may be interested in In situ cycling and mechanical testing of silicon nanowire anodes for lithium-ion battery applications Appl. Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography Sub-200 nm gap electrodes by soft UV nanoimprint lithography using polydimethyl...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:
  • IJAT

دوره 3  شماره 

صفحات  -

تاریخ انتشار 2009